EBALOY SNI黑色锡镍合金工艺
EBALOY SNI黑色锡镍合金电镀工艺主要设计目的是为镍镀层添上一层黑色装饰性表面效果。
- 一. 工艺特性
- 由于镀液稳定,所产生色泽也稳定;
- 加强防腐性能;
- 不需要保护层,因为锡镍镀层具有很好的耐磨损能力及防止表面氧化效果;
- 可用于滚镀工艺。
- 二. 镀液成份及操作条件
范 围 最 佳
SNI锡盐 g/L 8~15 10
SNI镍水 mL/L 160~240 200
SNI导电盐 g/L 150~280 200
SNC 3号添加剂 mL/L 10~20 15
镀液温度 ℃ 45~55 50
电镀时间 min. 1~5 2
pH值 7.0~8.5 7.7
阳极 炭板
阴极阳极面积比 1:1~1:2
镀液搅拌 阴极移动
镀液过滤 连续过滤
- 三. 溶液配制
EBALOY SNI黑色锡镍电镀溶液是以配制好的液体提供的,镀液可立即使用,不用稀释或调校。若要添加个别原料,则必需少量添加及搅拌均匀才可开始电镀。
四.电镀流程
EBALOY SNI黑色锡镍工艺起到使镍镀层表面变成黑色的效果。其流程如下:
镀镍®回收®清水洗®水洗®EBALOY SNI锡镍电镀®后处理®回收®水洗®水洗®干燥
五.设备
镀槽 加强PVC或钢槽衬胶里
加热器 石英或钛加热笔
阳极 炭板
搅拌 阴极移动最少1~2m/min
过滤 连续过滤
- 六. 溶液控制
- 保持原材料及添加剂浓度
每100Ah各项材料的消耗如下:
SNI锡盐 g 140
SNI镍水 mL 600
SNI导电盐 g 125
SNC 3#添加剂 mL 30
在实际生产情况下,大部分损耗来自带出损耗,故未固定生产量时可按上面数字参考补充。
ENLOY® SHADOW
Electrolytic black nickel process
ENLOY®阴影
电解黑镍工艺
ENLOY® SHADOW is a multiple additive, black nickel process that will produce a decorative black deposit on steel, brass, and copper plated components. The deposits are absolutely uniform. ENLOY SHADOW deposits exhibit excellent corrosion resistance and adhesion. The process offers excellent leveling and throwing power over a wide current density range using cathode rod agitation. PLEASE READ ENTIRE TECHNICAL DATA SHEET BEFORE USING THIS PRODUCT.
ENLOY®SHADOW是一种多添加剂黑镍工艺,可在钢、黄铜和镀铜部件上产生装饰性黑色沉积物。沉积物是绝对均匀的。ENLOY SHADOW沉积物表现出优异的耐腐蚀性和附着力。该工艺使用阴极棒搅拌,在宽电流密度范围内提供出色的整平和投掷功率。使用本产品前,请阅读完整的技术数据表。
FEATURES AND BENEFITS
功能和优点
- Excellent Leveling, Good Uniformity, And Ductility • Ease And Economy Of Operation Over A Wide Current Density Range
- Excellent Corrosion Resistance • Deposit Is Corrosion Resistant
- Absolutely Uniform Finish • Virtually Eliminates Rejects
- 良好的平整度、良好的均匀性和延展性 •在宽电流密度范围内操作方便且经济
- 卓越的耐腐蚀性 •沉积物耐腐蚀
- 绝对均匀的表面处理 •几乎消除了不合格品
MATERIALS REQUIRED
所需材料
For proper selection and use of system components, consult your Enthone-OMI representative.
如需正确选择和使用系统组件,请咨询您的Enthone OMI代表。
- Nickel Chloride (NiCl2 . 6H20), dry or liquid (Product Code Number UH01 or UL01).
- 氯化镍(NiCl2.6H20),干燥或液体(产品代码UH01或UL01)。
- ENLOY SHADOW SN (Product Code Number 5382) is used for make up and replenishment.
- ENLOY SHADOW SN(产品代码5382)用于补充和补充。
- ENLOY SHADOW NA (Product Code Number 5384) is used for make up and replenishment.
- ENLOY SHADOW NA(产品代码5384)用于补充和补充。
- ENLOY SHADOW K (Product Code Number 5383) may be required for make up and replenishment. It is used to raise the pH.
- 可能需要ENLOY SHADOW K(产品代码5383)进行补充和补货。它用于提高pH值。
- Hydrochloric Acid (HCl), AR grade, may be required to lower pH.
- 可能需要AR级盐酸(HCl)来降低pH值。
- Deionized or distilled water.
- 去离子水或蒸馏水。
EQUIPMENT REQUIRED
所需设备
Consult Enthone-OMI Technical Service Representative for design and material ecommendations.
有关设计和材料建议,请咨询Enthone OMI技术服务代表。
Tanks PVC or polypropylene or steel tanks lined with these materials.
容器 PVC或聚丙烯或钢储罐内衬这些材料。
Racks Plating rack coatings, usually PVC, must be approved by Enthone-OMI. Workpieces must be firmly attached to the racks. If the workpieces are very light, the racks should be correspond- ingly heavier to prevent swinging.
机架 电镀机架涂层,通常为PVC,必须经Enthone OMI批准。工件必须牢固地固定在机架上。如果工件很轻,支架应该相应地更重,以防止摆动。
Heating/Cooling Immersion heaters made of PTFE, PTFE coils or indirect heating.
加热/冷却 由PTFE、PTFE线圈或间接加热制成的浸入式加热器。
Fittings All fittings should be protected with PVC.
配件 所有配件均应采用聚氯乙烯保护。
Filtration Filtration will be required after solution make up or precipitation of white sludge.
过滤 白色污泥的溶液补充或沉淀后,需要进行过滤。
Rectifiers 8 volt units; for high output 12 volt units may be necessary. Must have capacity to develop necessary direct current, with less than 5% ripple at amperage used. Rectifiers must be pro- tected against corrosion from acid fumes or placed away from solution.
整流器 8伏单元;对于高输出,可能需要12伏单元。必须具有开发必要直流电的能力,在使用安培数时纹波小于5%。整流器必须进行防腐处理,以防受到酸性烟雾的腐蚀,或放置在远离溶液的地方。
Anodes/Bags Pure nickel anodes; no S-nickel. Anodes must be hung on pure nickel hooks; do not use tita- nium hooks or baskets. Anode bags are not necessary.
阳极/袋 纯镍阳极;没有S-镍。阳极必须挂在纯镍挂钩上;不要使用提塔牛钩或篮子。不需要阳极袋。
Ventilation Consult the American Conference of Industrial Hygienists book entitled, “Industrial Ventilation, A Manual of Recommended Practice.”
通风咨询 请参阅美国工业卫生学家会议题为“工业通风,推荐操作手册”的书
OPERATING CONDITIONS
操作条件
Nominal 名义值 | Range 范围 | |
pH | 5.0 | 4.5 to 5.5 |
Temperature 温度 | 140 °F (60 °C) | 130 to 150 °F (55 to 65 °C) |
Specific Gravity (at 20 °C/68 °F)
比重(20°C/68°F时) |
1.06 g/cm3 (8.21 ° Baumé) | |
Agitation 搅拌 | Required 需要 | Rack agitation; do not use air
机架搅拌;不要使用空气 |
Time 时间 | 5 minutes 5分钟 | 3 to 10 minutes 3-10分钟 |
Filtration 过滤 | Continuous; 2 to 3 times solution volume per hour
不断的每小时溶液体积的2至3倍 |
|
Current Density 电流密度 | 3.0 ASF (0.3 ASD) | 1.0 to 5.0 ASF (0.1 to 0.5 ASD) |
Voltage 电压 | Variable 变量 | 1.0 to 2.0 volts average
平均1.0至2.0伏 |
Rate Of Deposition - Time in seconds to ASD ASF Time
沉积速率-时间(以秒为单位)
deposit 0.1 µm (8 µ inches) average 0.3 3.0 60
沉积物平均0.1µm(8µ英寸)
MAKE-UP PROCEDURE
补给程序
100 Liters
100 升 |
100 Gallons
100 加仑 |
|
Nickel Chloride
氯化镍 |
8 Kg | 67 lb |
ENLOY SHADOW SN | 6.5 liters | 6.5 gal |
ENLOY SHADOW K | 4.0 liters | 4.0 gal |
ENLOY SHADOW NA | 13.5 liters | 13.5 gal |
Deionized or Distilled Water
去离子水或蒸馏水 |
As required
根据需要 |
As required
根据需要 |
Do not premix components prior to adding to the processing tank. Add the components in the order given. For each 100 gallons (378 liters) of final operating solution, proceed as follows.
在添加到处理罐之前,不要预混合成分。按照给定的顺序添加组件。对于每100加仑(378升)的最终操作溶液,进行如下操作。
- Heat 33 gallons (125 liters) of deionized or distilled water to 140 °F (60 °C). With continuous stirring, add the required amount of nickel chloride. Continue stirring until completely dissolved.
- 将33加仑(125升)去离子水或蒸馏水加热至140°F(60°C)。在连续搅拌的情况下,加入所需量的氯化镍。继续搅拌直至完全溶解。
- With continuous stirring, add the required amount of ENLOY SHADOW SN. It is preferable to dilute the com- ponent with deionized or distilled water and distribute it uniformly over the surface of the solution.
2.在连续搅拌的情况下,加入所需量的ENLOY SHADOW SN。最好用去离子水或蒸馏水稀释成分,并将其均匀分布在溶液表面。
- With continuous stirring, add the required amount of ENLOY SHADOW K. It is preferable to dilute the compo- nent with deionized or distilled water and distribute it uniformly over the surface of the solution.
3.在连续搅拌的情况下,加入所需量的ENLOY SHADOW K。最好用去离子水或蒸馏水稀释成分,并将其均匀分布在溶液表面。
- Check pH to ensure it has not dropped below 4.0. If lower than 4.0, add ENLOY SHADOW K in small incre- ments with continuous stirring until pH reaches 4.5 to 5.0.
4.检查pH值,确保其没有降至4.0以下。如果低于4.0,则在连续搅拌的情况下少量添加ENLOY SHADOW K,直到pH达到4.5至5.0。
- With continuous stirring, add the required amount of ENLOY SHADOW NA. It is preferable to dilute the com-ponent with deionized or distilled water and distribute it uniformly over the surface of the solution.
5.在连续搅拌的情况下,加入所需量的ENLOY SHADOW NA-用去离子水或蒸馏水稀释,并将其均匀分布在溶液表面。
- Fill to final volume with deionized or distilled water. Heat to operating temperature, if required.
6.用去离子水或蒸馏水填充至最终体积。如果需要,加热至工作温度。
- Filter for two to three hours. The operating solution is now ready for use.
7.过滤两到三个小时。操作解决方案现在可以使用了。
OPERATION
操作
It is important that the instructions in this Technical Data Sheet are carefully followed. Operation outside the des- ignated ranges could result in defective deposits and plating rejects. Specific gravity, temperature and pH values should be controlled daily. The use of automatic dosing pumps is recommended. Small, frequent additions are recommended. In no instance should the amount of replenish addition be more than the make up quantity. When making additions, it is preferable to dilute the component with water or plating solution and distribute it uniformly over the surface of the solution.
务必认真遵守本技术数据表中的说明。超出指定范围的操作可能导致有缺陷的沉积物和镀层不合格。应每天控制比重、温度和pH值。建议使用自动加药泵。建议少量、频繁添加。在任何情况下,补充添加的数量都不应超过补充数量。添加时,最好用水或电镀溶液稀释成分,并将其均匀分布在溶液表面。
Pre-treatment
预处理
Prior to plating,the work surface should be pre-treated in a dilute hydrochloric acid (5% HCl) dip.
电镀前,应在稀盐酸(5%HCl)浸液中对工作表面进行预处理。
Post Treatment
后处理
After plating, an acidic drag out rinse is recommended to avoid precipitation of metal salts. The pH of the drag out rinse should be adjusted to 3.0 to 4.0 with hydrochloric acid.
电镀后,建议进行酸性冲洗,以避免金属盐沉淀。应使用盐酸将拖出冲洗液的pH值调节至3.0至4.0。
Maintenance
维护
The ENLOY SHADOW operating solution should be analyzed periodically for ENLOY SHADOW SN and ENLOY SHADOW NA and replenished as required. Analytical procedures for these two components are available from Enthone-OMI.
ENLOY SHADOW操作溶液应定期分析ENLOY SHADOW SN和ENLOY SHADOW NA,并根据需要补充。这两种成分的分析程序可从Enthone OMI获得。
OPERATION (Cont’d)
操作(续)
EBALOY SNC BLACK PROCESS
黑 色 锡 钴 合 金 电 镀 工 艺
- 简介
EBALOY SNC BLACK是一种装饰性电镀工艺,其镀层具有一种独特美丽黑色效果。一般此工艺是在光亮镍或沙镍镀层上镀成其特别效果。
- 工艺特性
- 具有美丽独特之黑色镀层。
- 镀液稳定性高,镀层色泽亦较稳定。
- 覆盖能力高,可作滚镀用。
- 镀液容易调校,典型之合金电镀困难不存在。
- 镀液配制程序
EBALOY SNC BLACK 镀液已经是可用液,不用稀释或调校。
- 标准镀液成份
SNC锡盐 10 克/升
SNC钴盐 30 克/升
SNC导电盐 320 克/升
SNC NO.1添加剂 100 毫升/升
SNC NO.3添加剂 20 毫升/升
- 操作流程
锡钴合金电镀一般都需要光亮镍作底层电镀,其流程如下:
光亮镀镍→回收→水洗→水洗→ EBALOY SNC BLACK →回收→水洗→后处理*→回收→水洗→水洗→干燥
* 后处理:主要功用是增加镀层之防腐能力。
一般可以使用铬酸浸洗 --- 铬酸片 :50 克/升
浸渍时间 :30 秒
温 度 :室 温
本公司出产之ECR-500亦可作为后处理工艺。
- 镀液控制及补充量
每100安培小时消耗:
挂 镀 滚 镀
SNC 锡盐 0.20 - 0.25 0.8 - 1.3 公斤
SNC 钴盐 0.35 - 0.40 0.9 - 1.5 公斤
SNC 导电盐 1.0 - 1.5 7.5 - 15 公斤
SNC NO.1添加剂 0.4 - 0.7 3 - 6 升
SNC NO.3添加剂 0.08 - 0.11 0.3 - 0.6 升
补充时必须小量添加至完全溶解才可再加。
- 标准操作条件